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General Information
    • ISSN: 1793-8198 (Print)
    • Abbreviated Title: Int. J. Mater. Mech. Manuf.
    • Frequency: Bimonthly
    • DOI: 10.18178/IJMMM
    • Editor-in-Chief: Prof. Ian McAndrew
    • Co-editor-in-Chief: Prof. K. M. Gupta
    • Executive Editor: Cherry L. Chen
    • Abstracting/Indexing: Inspec (IET), Chemical Abstracts Services (CAS),  ProQuest, Crossref, Ulrich's Periodicals Directory,  EBSCO.
    • E-mail ijmmm@ejournal.net

Editor-in-chief
Prof. Ian McAndrew
Capitol Technology University, USA
It is my honor to be the editor-in-chief of IJMMM. I will do my best to work with the editorial team and help make this journal better.

IJMMM 2019 Vol.7(4): 170-174 ISSN: 1793-8198
DOI: 10.18178/ijmmm.2019.7.4.453

Test Method for Plane Stress Fracture Toughness of Thin Sheet Metal

Wen Zheng, Kai-Ye Xiao, Hai Xu, and Zhi-Wei Guo
Abstract—In this paper, the plane stress fracture toughness (KC) of sheet metal similar to 60Si2Mn with a thickness of about 0.9mm is measured through the central crack tensile specimen (MT specimen) and the compact tensile specimen (CT specimen). The compliance calibration curve and KR curve are obtained on the basis of the reasonably designed fixture and anti-buckling device. Then the KC values are calculated by CT specimens. This paper also discussed the minimum plate width when MT specimens satisfied the requirements for validity judgement.

Index Terms—Plane stress fracture toughness, MT specimen, CT specimen, compliance calibration curve, KR curve.

The authors are with Research Institute of Physical and Chemical Engineering of Nuclear Industry, Tianjin 300180, China (Corresponding author: Wen Zheng; e-mail: zw19840801@163.com).

[PDF]

Cite: Wen Zheng, Kai-Ye Xiao, Hai Xu, and Zhi-Wei Guo, "Test Method for Plane Stress Fracture Toughness of Thin Sheet Metal," International Journal of Materials, Mechanics and Manufacturing vol. 7, no. 4, pp. 170-174, 2019.

Copyright © 2019 by the authors. This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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